Future subatomic ionization techniques, such as using ion beam etching or focused ion beam (FIB) milling, could potentially enable the marking of playing cards with Angstrom-level precision by:
1. Focused ion beam milling: This technique uses a focused ion beam to remove material from the surface of a card to create a micro-pattern that can be read with a special device or camera.
2. Ion beam etching: This technique uses an ion beam to etch a pattern into the surface of the card.
1. Focused ion beam milling: This technique uses a focused ion beam to remove material from the surface of a card to create a micro-pattern that can be read with a special device or camera.
2. Ion beam etching: This technique uses an ion beam to etch a pattern into the surface of the card.